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  • Thank you for visiting Photomask Japan 2005.
    Photomask Japan 2006 will be held in April 2006 at Pacifico Yokohama.
    We look forward to seeing you at the next edition!

    Photomask Japan 2005 Results

    Symposium Attendees
    535
    Visitors to Exhibition only 251

Photomask Japan 2005 is the 12th international symposium on photomasks and NGL masks in the Far East. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster session, and panel discussion. Exihibition will be provided to mask manufacturing materials, and equipment companies.