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Thank you for visiting Photomask Japan 2006.
Photomask Japan 2007 will be held in April 2007 at Pacifico Yokohama.
We look forward to seeing you at the next edition!

  • Photomask Japan 2006 Results
    Symposium Attendees 553
    Visitors to Exhibition only 328


PhotomaskJapan2006 is the 13th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Topics
 
Photomask Manufacturing (Inclusive of RET-masks)
 
  • Materials (Blanks, Resist, Pellicle)
  • Resist Processing and Etching
  • Cleaning and pelliclization
  • Mask pattern generation (E-beam and Laser)
  • Yield Management (Defect and Accuracy)
Photomask Inspection, Repair and Metrology (Tools and Technologies)
 
  • Inspection
  • Repair
  • Metrology
Data Processing and Design
 
  • Mask Data Preparation
  • Design and data modeling
  • Design for Manufacturability
RET and Mask Related Lithography Technologies
 
  • Lithography Technologies (PSM/OPC/RET)
  • Novel Photomasks and Innovative Techniques
  • Wafer Fab Issues with Masks
NGL Mask Technologies
 
  • EUV Lithography
  • Emerging Lithographic technologies
Mask Business and Management
 
  • Mask Business and Management