Best Paper Award
The Award Winners of Best Presentation
Number Title Author Affiliation
3-03
[6607-11]
Alternating Phase-Shift Mask and Binary Mask for 45-nm
Node and Beyond:The Impact on the Mask Error Control
Y.Kojima(1), M.Shirasaki(1), K.Chiba(1), T.Tanaka(1), K.Iwase(2), K.Ishikawa(2), K.Ozawa(2), Y.Inazuki(3), H.Yoshikawa(3), S.Okazaki(3) (1)Toppan Printing Co., Ltd. (Japan)
(2)Sony Corp. (Japan)
(3)Shin-Etsu Chemical Co., Ltd. (Japan)
Best Paper for BACUS
8-02
[6607-34]
Novel solution for in-die phase control under scanner equivalent optical settings for 45nm node and below S.Perlitz(1), U.Buttgereit(1), T.Scheruebl(1), K.m.Lee(2), M.Tavassoli(2), M.Lau(2) (1)Carl Zeiss SMS GmbH(Germany)
(2)Intel Mask Operation(USA)
13-01
[6607-56]
Impact of Scanner Model Vectorization On Optical Proximity Correction J.K.Tyminski(1), T.Nakashima(2), Q.Zhang(3), T.Matsuyama(2), K.Lucas(4) (1)Nikon Precision Inc.(USA)
(2)Nikon Corporation(Japan)
(3)Synopsys Inc.(CA USA)
(4)Synopsys Inc.(TX USA)
The Award Winners of Best Poster
Number Title Author Affiliation
5f-03
[6607-85]
Impact of Transmitted & Reflected Light Inspection on Mask Inspectability, Defect Sensitivity and Mask Design Rule Restrictions Y.Kodera(a), K.Badger(b), E.Gallagher(b), S.Akima(d), M.Lawliss(b), H.Ikeda(a), I.Stobert(c), Y.Kikuchi(a) (a)Toppan Electronics Inc. (USA)
(b)IBM Systems and Technology Group (VT USA)
(c)IBM Systems and Technology Group (NY USA)
(d)Toppan Printing Co., Ltd. (Japan)
5k-02
[6607-109]
New OPC method for contact layer to expand process margin M.Oka, R.Tsutsui, H.Oishi, K.Tsuchiya, H.Ohnuma Sony Corp. (Japan)
5m-08
[6607-124]
Progress of NIL template making S.Yusa, T.Hiraka, A.Kobiki, S.Sasaki, K.Itoh, N.Toyama, M.Kurihara, H.Mohri, N.Hayashi Dai Nippon Printing Co., Ltd. (Japan) Best Paper for EMLC