What's new!
Thank you for visiting Photomask Japan 2007.
Photomask Japan 2008 will be held in 16-18 April 2008 and
Technical Exhibition will be held in 16-17 April 2008 at Pacifico Yokohama.
We look forward to seeing you at the next edition!
  • Photomask Japan 2007 Results
    Symposium Attendees 586
    Visitors to Exhibition only 288


Photomask Japan 2007 is the 14th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Topics
 
  • Fabrication Process Steps and Equipments for Photomasks (process and equipments for developing, etching, cleaning, and so on)
  • Photomask Writing Tools and Technologies
  • Metrology Tools and Technologies
  • Inspection Tools and Technologies
  • Repairing Tools and Technologies
  • Mask Data Preparations
  • EDA for Photomask
  • Photomasks with RET: PSM, Masks with OPC
  • Photomask relating Lithography Technologies
  • NGL Masks: EUV, E-Beam, Imprint etc.
  • Mask Cost and Mask Development Strategy
  • Materials of and for Photomasks