PMJ2008 Technical Exhibition
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Exhibitor's Information
Photomask Japan 2008 Introduction
In April of 2008, Photomask Japan Executive Committee (Organizer: Photomask Japan, BACUS and SPIE) will hold the 15th International Symposium, called "Photomask Japan 2008."
The aim of the conference is to bring together scientists, researchers, engineers and industry participant to discuss recent progress and future trends of the field. Furthermore, Photomask Japan is an ideal chance to introduce the equipment in connection with photomask technology, parts, material, or software, along with the papers presented.
This symposium is concurrently held with a technical exhibition, supported by SEMI Japan.
We appreciate your attention and look forward to your participation in the exhibition.

Exhibition Outline
Title: Photomask Japan 2008 Technical Exhibition
Organizer: Photomask Japan / BACUS / SPIE
Sponsor: SEMI Japan
Aim: To introduce and showcase the newest and emerging devices, parts, materials, software, etc for photomask and NGL mask technologies leading to discussions on recent progress, applications, and future trends.
Period: April 16 (Wed.) - 17 (Thu.), 2008
* Symposium will be held from April 16 (Wed.) - 18 (Fri.), 2008  
Venue: Pacifico Yokohama (Annex Hall)
1-1-1 Minato Mirai, Nishi-ku, Yokohama-city, Kanagawa 220-0012, JAPAN
<For access> http://www.pacifico.co.jp/english/accessmap.html

Exhibiting Items
1. Photomask materials
2. Mask materials
3. Resist / Light-sensitive films
4. Fabrication / Process
5. Inspection equipment
6. Repair equipment
7. Metrology / Testing equipment
8. Cleaning equipment
9. CAD Data process equipment
10. Simulation
11. Publication / Service

Schedule (*tentative)
January 11 (Fri.), 2008    Deadline for Application (* tentative)
February, 2008 Receipt of an Invoice for Exhibition Fee and an Exhibitor’s Manual.
March, 2008 Notification of Floor Plan
March 28 (Fri.), 2008 Due Date of Exhibition Fee Payment
April 15 (Tue.), 2008 Move-in Day
April 16 (Wed.), 2008 Exhibition Day 1
April 17 (Thu.), 2008 Exhibition Day 2 & Move-out after Exhibition Closed

Booth
Exhibit Fee: JPY 200,000 / booth unit (tax incl.)

Exhibition fee includes a shell-scheme booth package.

(1) Back panel (W1.8m x H2.4m) x 1
(2) Side panels (W0.9m x H2.4m) x 2
(3) Table with white cloths (W1.8m x D0.6m) x 1
(4) Chair x 1
(5) Fluorescent Light (40w) x 1
(6) Company Name Board (In English and Japanese) x 1
      *upon request
(7) AC Power Outlet (100V/ 1kW) x 1
      *upon request

* Order of additional decorating and display fixtures will be charged separately.
**  Up to two persons per booth unit may participate in the symposium at a special fee. Details will be announced at a later date.


Exhibitor Application Regulations
Application:
Please contact the below secretariat for information as soon as possible.
Deadline: January 11 (Fri.), 2008
Submit Application to: Photomask Japan Exhibition Secretariat
FAX: +81-3-3292-1813
Inquiries:
Note:
  • Please make a payment for Exhibition Fee by bank transfer in Japanese Yen no later than March 28 (Fri.), 2008.
  • Application is accepted up to two booths per company.
  • Booth location will be decided by the Photomask Japan Organizer.
  • Request for change may be made depending on the final number of exhibitors.

[Cancellation Policy]
In principle, cancellations will not be accepted after the participation confirmation is notified to exhibitors. If cancellation is unavoidable, the following charges should be applied:

After receipt of application form until January 15 (Tue.), 2008 No charge
From January 16 (Wed.) to February 29 (Fri.), 2008  50% of total participation fee
After March 1 (Sat.) , 2008 100% participation fee