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=== IMPORTANT NOTICE ===

Please be reminded that the PMJ2012 will be held in different place on the 1st day, and will be held at Pacifico Yokohama as usual from 2nd day.

Registration Desk
April 1711:30am - 18:00pm5F Lobby, Minato Mirai Hall
April 188:30am - 17:00pm2F Lobby, Annex Hall of Pacifico Yokohama
April 198:30am - 17:00pm2F Lobby, Annex Hall of Pacifico Yokohama

Access to Minato Mirai Hall

Photomask Japan 2012 is the 19th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

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