Organizer


September 16-18, 2014


June 24-25, 2014

Photomask Japan Secretariat
c/o ICS Convention Design, Inc.
Tel +81-3-3219-3541
Fax +81-3-3219-3577
e-mail: 

Symposium Information

Photomask Japan 2014
The 21st Symposium on Photomask and NGL Mask Technology

Date
:  Tuesday, April 15 - Wednesday, April 16, 2014
Venue
:  Annex Hall, Pacifico Yokohama, Yokohama Japan
   http://www.pacifico.co.jp/english/facility/accessmap.html
Official Language
:  English

Organized by Photomask Japan and SPIE
Co-organized by BACUS and EMLC

In Cooperation with
The Japan Society of Applied Physics
The Japan Society for Precision Engineering
The Institute of Electrical Engineering Japan

Technical Exhibit in Cooperation with SEMI Japan

Supported by City of Yokohama