Organizer


September 12- 14, 2016


June 21- 22, 2016

Photomask Japan Secretariat
c/o ICS Convention Design, Inc.
Tel +81-3-3219-3541
Fax +81-3-3219-3577
e-mail: 

Symposium Information

Photomask Japan 2016
The 23rd Symposium on Photomask and NGL Mask Technology

Date
:  Wednesday, April 6 - Friday, April 8, 2016
Venue
:  Annex Hall, PACIFICO Yokohama, Japan
   http://www.pacifico.co.jp/english/facility/accessmap.html
Official Language
:  English

Organized by Photomask Japan and SPIE
Co-organized by BACUS and EMLC

Supported by City of Yokohama
       The Japan Society of Applied Physics
       The Japan Society for Precision Engineering
       The Institute of Electrical Engineering Japan

Technical Exhibit in Cooperation with SEMI Japan