| To Submit an Abstract: |
Abstracts must be written and presented in English.
All abstracts must be submitted electronically in a PDF File via the conference website.
Please note: the electronic abstract submission system will be closed on 15 November 23 November (extended!!) and late abstracts will not be accepted.
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| All abstracts must contain the following information: |
| 1. |
Title of Abstract: |
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Title should be in bold font, using both upper and lower case. |
| 2. |
Names of All Authors: |
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Names should be grouped by affiliation, listing Presenting Author first. Please include both family and given names. Also include the complete company/university name, mailing address, and email address for each individual author. |
| 3. |
Abstract Text and Figures: |
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Text should be approximately 250 words. One additional page for figures is acceptable. |
| 4. |
Keywords: |
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List maximum of five keywords. Please choose at least one keyword for your abstract. |
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| Sample Abstract Format: |
(1) Title
(2) Complete Author List |
| E.g., Kokoro Kato (SII Nano Technology Inc., Japan), Shinji Akima (Toppan Printing Co, Ltd., Japan), Ichiro Kagami (Sony Corp., Japan), Hiroshi Mohri (Dai Nippon Printing Co., Ltd., Japan)
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(3) Abstract Text
(4) Keyword(s) |
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| (1) |
and (2) should be centered on the page. |
| (2) |
Authors names should be spelled out completely. |
| (3) |
should be 250 words. |
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| Instruction |
| Deadline: |
15 November 23 November (Extended!!) |
| Submission: |
Only via online |
| Form: |
No fax and e-mail submission are accepted.
Please fill in the form and submit the abstract.
Abstract should be written not to exceed 250 words. |
| You are requested to choose topic applicable to your paper from among the items listed in the Themes and Topics below. |
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| Topics: |
- Materials of and for Photomasks
- Fabrication Process Steps and Equipments for Photomasks
(process and equipments for developing, etching, cleaning etc.)
- Photomask Writing Tools and Technologies
- Metrology / Inspection / Repairing Tools and Technologies
- Mask Degradation issues
- Mask Data Preparations
- EDA and DFM for Photomasks
- Photomasks with RET: PSM, Masks with OPC
- Photomask-relating Lithography Technologies
- EUV masks and Infrastructure
- NGL masks and Application: Nano-imprint, Patterned media etc.
- Strategies and Buisiness Challenges: Cost, Cycle-Time, ML2 etc.
- Photomasks for Flat Panel Display
You will receive your reference number in return by e-mail when the submission succeeded.
If you do not receive a response within 24 hours, Please contact the Photomask Japan Abstract Submission Office. |
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| Notification of Acceptance: |
| The Photomask Japan Program Committee will review all contributed abstracts. Applicants will be notified of acceptance or rejection by e-mail no later than the end of December 2011. |
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| For any inquiries about abstract submission, please contact: |
Photomask Japan Abstract Submission Office
E-mail : pmj-p@ics-inc.co.jp
Fax : 81-3-3219-3577 |
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