What's new!

Registration and Accommodation pages are now available! (Deadline for the early registration is March 31, 2010) Manuscript Submission is now available at Author Guideline page. Camera-Ready Abstract Submission is now available in "Author Guideline" page! The program (tentative) is available in "Program" page. Deadline for Abstract submission has been extended to November 20, 2009!! Abstract submission is now available in "Abstract Submission" page! Photomask Japan 2010 will be held in 13-15 April 2010 and Technical Exhibition will be held in 13-14 April 2010 at Pacifico Yokohama. We are looking forward to seeing you there!

Photomask Japan 2010 is the 17th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Topics   Materials of and for Photomasks Fabrication Process Steps and Equipments for Photomasks (process and equipments for developing, etching, cleaning etc.) Photomask Writing Tools and Technologies Metrology Tools and Technologies Inspection Tools and Technologies Repairing Tools and Technologies Mask Data Preparations EDA and DFM for Photomasks Photomasks with RET: PSM, Masks with OPC Photomask-relating Lithography Technologies NGL Masks and Applications: EUV, Nano-imprint etc. Strategies and Business Challenges: Cost, Cycle-Time, ML2 etc.