What's new!

Photomask Japan 2010 will be held in 13-15 April 2010 and Technical Exhibition will be held in 13-14 April 2010 at Pacifico Yokohama. We are looking forward to seeing you there! "1st Announcement and Call for Papers" is now available to download. All Authors are encouraged to submit their abstract by the due date via the PMJ web. Abstract Due Date: November 2009 Camera-Ready Abstract: February 2010

Photomask Japan 2010 is the 17th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Topics   Materials of and for Photomasks Fabrication Process Steps and Equipments for Photomasks (process and equipments for developing, etching, cleaning etc.) Photomask Writing Tools and Technologies Metrology Tools and Technologies Inspection Tools and Technologies Repairing Tools and Technologies Mask Data Preparations EDA and DFM for Photomasks Photomasks with RET: PSM, Masks with OPC Photomask-relating Lithography Technologies NGL Masks and Applications: EUV, Nano-imprint etc. Strategies and Business Challenges: Cost, Cycle-Time, ML2 etc.