|Photomask Japan 2005 is the 12th
international symposium on photomasks and NGL masks in the Far East. The
aim of the symposium is to bring together engineers and investigators from
Japan, USA, and all over the world in the field of photomasks, NGL masks,
and related technologies to discuss recent progress, applications, and future
trends. The conference program will feature invited papers, contributed
papers, poster session, and panel discussion. Exihibition will be provided
to mask manufacturing materials, and equipment companies.