PMJ 2006 Technical Exhibition
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Exhibitor's Information
Photomask Japan 2006 Introduction
In April of 2006, the Photomask Japan Executive Committee (Organizer: Photomask Japan, BACUS and SPIE) will hold the 13th International Symposium, called “Photomask Japan 2006”. The aim of the conference is to bring together scientists, researchers, engineers and application people to discuss recent progress and future trends of the field. Furthermore, Photomask Japan is an ideal chance to introduce the equipment in connection with photomask technology, parts, material, or software, and along with the papers presented. This exhibition is supported by SEMI Japan. Improving on last year’s exhibition, there are various plans in place, such as the installation of business discussion lounges, to make this event even more prosperous for our exhibitors. We look forward to your participation.

Exhibition Outline
Title: Photomask Japan 2006 Exhibition
Organizer: Photomask Japan/ BACUS/ SPIE
Sponsor: SEMI Japan
Aim: Introduce and showcase the newest and emerging devices, parts, materials, software, etc for photomask and NGL mask technologies leading to discussions on recent progress, applications, and future trends.
Period: April 18 (Tue) - 19 (Wed), 2006
* Symposium will be held from April 18 (Tue) – 20 (Thu), 2006
Venue: Pacifico Yokohama (Conference Center)
1-1-1 Minato Mirai, Nishi-ku, Yokohama-city, Kanagawa 220-0012, JAPAN
<For access>

Exhibiting Items
Photomask materials
Resist / Light-sensitive films
Fabrication / Process
Inspection equipment
Repair equipment
  Metrology / Testing equipment
Cleaning equipment
CAD Data process equipment
Publication / Service

Schedule (*tentative)
January 13, 2006   Deadline for Application
February, 2006 Confirmation with Invoice and Exhibition Manual will be sent to exhibitors.
March, 2006 Exhibitors Meeting
March 31, 2006 Due Date of Exhibition Fee Payment
April 17, 2006 Move-in
April 18, 2006 Exhibition Day 1
April 19, 2006 Exhibition Day 2 & Move-out after Exhibition Closed

Exhibit Fee: JPY 180,000 / booth unit (tax incl.)

Exhibition fee includes schell-scheme booth plan.

(1) Back & Side Panel (W1.8m x D0.9m x H2.4m)
(2) Table with white cloths (W1.8m x D0.6m): 1
(3) Chair: 1
(4) Fluorescent Light: 1
(5) Company Name Board
(In English and Japanese) *upon request
(6) AC Power Outlet (100V/ 1kW) *upon request

* Additional decorating and display fixtures ordered in addition to the above will be charged separately.
** Up to two exhibitors per booth unit may participate in the symposium for JPY 30,000 / person (tax incl.)

Exhibitor Application Regulations
Please fill in the attached "Application Form" by fax to the Exhibition Secretariat.
Deadline: January 13 (Fri.), 2006
Submit Application to: Photomask Japan Exhibition Secretariat
FAX: +81-3-3292-1813
  • Confirmation Letter, Exhibitor Manual and Exhibit Fee Invoice will be sent in February.
  • Please make payment by bank transfer in Japanese Yen no later than March 31, 2006.
  • Smallest available space is one booth unit with the largest being two booth units.
  • Booth location will be decided by the Photomask Japan Organizer.
  • There may be changes to the floor plan depending on the exact number of companies that participate.

[Cancellation Policy]
In principle, cancellations will not be accepted after the participation confirmation notice has been made to contracted exhibitors. If cancellation is unavoidable, the following charges apply:

From application until confirmation letter is sent No charge
After confirmation until February 28, 2006 50% of total participation fee
After March 1, 2006 100% participation fee