PMJ2010 Technical Exhibition
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Exhibitor's Information
Exhibition Outline
Title: Photomask Japan 2010 Technical Exhibition
Organizer: Photomask Japan / SPIE
Co-Organizers: BACUS/ EMLC
Sponsor: SEMI Japan
Aim: To introduce and showcase the newest and emerging devices, parts, materials, software, etc for photomask and NGL mask technologies leading to discussions on recent progress, applications, and future trends.
Period: April 13 (Tue.) - 14 (Wed.), 2010
* Symposium will be held from April 13 (Tue.) - 15 (Thu.), 2010
Venue: Pacifico Yokohama (Annex Hall)
1-1-1 Minato Mirai, Nishi-ku, Yokohama-city, Kanagawa 220-0012, JAPAN
<For access>

Exhibiting Items
1. Photomask materials
2. Mask materials
3. Resist / Light-sensitive films
4. Fabrication / Process
5. Inspection equipment
6. Repair equipment
7. Metrology / Testing equipment
8. Cleaning equipment
9. CAD Data process equipment
10. Simulation

Application form
Application form

Exhibit Fee: JPY 200,000 / booth unit (tax incl.)

Exhibition fee includes a shell-scheme booth package.

(1) Back panel (W1.8m x H2.4m) x 1
(2) Side panels (W0.9m x H2.4m) x 2
(3) Table with white cloths (W1.8m x D0.6m) x 1
(4) Chair x 1
(5) Fluorescent Light (40w) x 1
(6) Company Name Board (In English and Japanese) x 1
      *upon request
(7) AC Power Outlet (100V/ 1kW) x 1
      *upon request

* Order of additional decorating and display fixtures will be charged separately.
**  Up to two persons per booth unit may participate in the symposium at a special fee. Details will be announced at a later date.