Symposium Information
Photomask Japan 2010
Symposium on Photomask and NGL Mask Technology XVII
Date : Tuesday, April 13 - Thursday, April 15, 2010
Venue : Annex Hall, Pacifico Yokohama, Yokohama Japan
Floor Plan
Official Language : English
Banquet : April 13, 2010
Exhibition : 10:00-18:30, Tuesday, April 13
10:00-16:00, Wednesday, April 14
Floor Plan
Program : Please see the Program Page

Organized by Photomask Japan and SPIE
Co-organized by BACUS and EMLC

In Cooperation with
The Japan Society of Applied Physics,
The Japan Society for Precision Engineering and
The Institute of Electrical Engineers of Japan

Technical Exhibit in Cooperation with SEMI Japan

Supported by City of Yokohama