Symposium Information
Photomask Japan 2011
Symposium on Photomask and NGL Mask Technology XVIII
Date : Wednesday, April 13 - Friday, April 15, 2011
Venue : Annex Hall, Pacifico Yokohama, Yokohama Japan
Official Language : English
Banquet : April 13, 2011
Exhibition : Wednesday, April 13 and Thursday, April 14
Program : check the program page

Organized by Photomask Japan and SPIE
Co-organized by BACUS and EMLC

In Cooperation with
The Japan Society of Applied Physics,
The Japan Society for Precision Engineering and
The Institute of Electrical Engineers of Japan

Technical Exhibit in Cooperation with SEMI Japan

Supported by City of Yokohama