Symposium Information

Photomask Japan 2012
Symposium on Photomask and NGL Mask Technology XIX

Date : Tuesday, April 17- Thursday, April 19, 2012
Venue :
Official Language : English
Banquet : April 17, 2012
Exhibition : Wednesday, April 18 and Thursday, April 19
Program : check the Program Page

Organized by   Photomask Japan and SPIE
Co-organized by   BACUS and EMLC

In Cooperation with
The Japan Society of Applied Physics
The Japan Society for Precision Engineering
The Institute of Electrical Engineers of Japan

Technical Exhibit in Cooperation with SEMI Japan

Supported by City of Yokohama