September 29 - October 1, 2015

June 22-23, 2015

Photomask Japan Secretariat
c/o ICS Convention Design, Inc.
Tel +81-3-3219-3541
Fax +81-3-3219-3577

Symposium Information

Photomask Japan 2015
The 22nd Symposium on Photomask and NGL Mask Technology

:  Monday, April 20 - Wednesday, April 22, 2015
:  Conference Center, PACIFICO Yokohama, Yokohama Japan
Official Language
:  English

Organized by Photomask Japan and SPIE
Co-organized by BACUS and EMLC

In Cooperation with
The Japan Society of Applied Physics
The Japan Society for Precision Engineering
The Institute of Electrical Engineers of Japan

Technical Exhibit in Cooperation with SEMI Japan

Supported by City of Yokohama