September 12- 14, 2016

June 21- 22, 2016

Photomask Japan Secretariat
c/o ICS Convention Design, Inc.
Tel +81-3-3219-3541
Fax +81-3-3219-3577

Symposium Information

Photomask Japan 2016
The 23rd Symposium on Photomask and NGL Mask Technology

:  Wednesday, April 6 - Friday, April 8, 2016
:  Annex Hall, PACIFICO Yokohama, Japan
Official Language
:  English

Organized by Photomask Japan and SPIE
Co-organized by BACUS and EMLC

Supported by City of Yokohama
       The Japan Society of Applied Physics
       The Japan Society for Precision Engineering
       The Institute of Electrical Engineers of Japan

Technical Exhibit in Cooperation with SEMI Japan