Symposium Information

Photomask Japan 2013
The 20th Symposium on Photomask and NGL Mask Technology

Date : Tuesday, April 16 - Thursday, April 18, 2013
Venue : Annex Hall, Pacifico Yokohama, Yokohama Japan
Official Language : English
Exhibition : Wednesday, April 17 and Thursday, April 18

Organized by   Photomask Japan and SPIE
Co-organized by   BACUS and EMLC

In Cooperation with
The Japan Society of Applied Physics
The Japan Society for Precision Engineering
The Institute of Electrical Engineers of Japan

Technical Exhibit in Cooperation with SEMI Japan

Supported by City of Yokohama