Organizer


September 16-18, 2014


June 24-25, 2014

Photomask Japan Secretariat
c/o ICS Convention Design, Inc.
Tel +81-3-3219-3541
Fax +81-3-3219-3577
e-mail: pmj@ics-inc.co.jp

What's new!

  • Photomask Japan 2014 Results
    Symposium Attendees 286
    Visitors to Exhibition only 155
  • Registration Desk
    Open hours:
    April 15 (Tue.) 9:30 - 18:30
    April 16 (Wed.) 8:30 - 17:00
    Place:
    Annex Hall, Pacifico Yokohama, Yokohama Japan
    We are looking forward to seeing you in PMJ2014!!
  • Registration is now available!
  • PMJ2014 - Special Poster Session
    "Photomask Related Technologies in Academia"
    PMJ2014 Program Committee plans to hold a Special Poster Session and will accept submissions from academia. Please contact Dr. Kokoro Kato, chair of the program committee to present at the special poster session.
  • Exhibition and Sponsorship Application is now available!
  • Deadline for Abstract Submission has been extended!
    Deadline: Monday, December 16, 2013
  • Abstract Submission is now available!
  • 1st Announcement is now available!

Photomask Japan 2014 is the 21st international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Program Summary of Past PMJ (Japanese Only)

Topics

  • Materials of and for Photomasks
  • Fabrication Process Steps and Equipments for Photomasks
    (process and equipments for developing, etching, cleaning etc.)
  • Photomask Writing Tools and Technologies
  • Metrology Tools and Technologies
  • Inspection Tools and Technologies
  • Repairing Tools and Technologies
  • Technologies and infrastructures for EUVL masks
  • Mask Data Preparations, EDA and DFM
  • Photomasks with RET: PSM, OPC, SMO and Multiple Patterning
  • Photomask-relating Lithography Technologies
  • NIL and masks for Patterned Media
  • Photomasks for FPD
  • DSA (Directed Self-Assembly)
  • Strategies and Business Challenges: Cost, Cycle-Time, ML2 etc.