Photomask Japan 2005 TECHNICAL EXHIBITION
| PMJ 2005 Exhibitors List | PMJ 2005 Outline | Exhibitor's Information | Exhibitor terms & conditions |
Exhibitor's Information
Photomask Japan 2005 Introduction
In April of 2005, the Photomask Japan Executive Committee (Organizer: Photomask Japan, BACUS and SPIE) will hold the 12th International Symposium, called "Photomask Japan 2005".
The aim of the conference is to bring together scientists, researchers, engineers and application people to discuss recent progress and future trends of the field. Furthermore, Photomask Japan is an ideal chance to introduce the equipment in connection with photomask technology, parts, material, or software, and along with the papers presented. This exhibition is supported by SEMI Japan.
Improving on last year's exhibition, there are various plans in place to make this event even more prosperous for our exhibitors.
We look forward to your participation.

Exhibition Outline
Title: Photomask Japan 2005 Exhibition
Organizer: Photomask Japan/ BACUS/ SPIE
Sponsor: SEMI Japan
Aim: Introduce and showcase the newest and emerging devices, parts, materials, software, etc for photomask and NGL mask technologies leading to discussions on recent progress, applications, and future trends.
Period: April 13 (Wed) - 14 (Thu), 2005
* Symposium will be held from April 13 (Wed) - 15 (Fri), 2005
Venue: Pacifico Yokohama (Annex Hall)
1-1-1 Minato Mirai, Nishi-ku, Yokohama-city, Kanagawa 220-0012, JAPAN

Exhibiting Items
Photomask materials
Resist / Light-sensitive films
Fabrication/ Process
Inspection equipment
Repair equipment
  Metrology / Testing equipment
Cleaning equipment
CAD Data process equipment
Simulation
Publication/ Service

Schedule (*tentative)
December 20, 2004 Deadline for Application
End of January, 2005 Confirmation with Invoice and Exhibition Manual will be sent to exhibitors.
February, 2005 Exhibitors Meeting
March 31, 2005 Due Date of Exhibition Fee Payment
April 12, 2005 Move-in
April 13, 2005
Exhibition Day 1
April 14, 2005 Exhibition Day 2 & Move-out after Exhibition Closed

Booth
Exhibit Fee: JPY 180,000 / booth unit (tax incl.)

Exhibition fee includes schell-scheme booth plan.

(1) Back & Side Panel (W1.8m x D0.9m x H2.4m)
(2) Table with white cloths (W1.8m x D0.6m): 1
(3) Chair: 1
(4) Fluorescent Light: 1
(5) Company Name Board
(In English and Japanese) *upon request
(6) AC Power Outlet (100V/ 1kW) *upon request

* Additional decorating and display fixtures ordered in addition to the above will be charged separately.
** Up to two exhibitors per booth unit may participate in the symposium for JPY 30,000 / person (tax incl.)


Exhibitor Application Regulations
Application:
Please fill in the attached “Application Form” by fax to the Exhibition Secretariat.
Deadline: December 20 (Mon), 2004
Submit Application to: Photomask Japan 2005 Exhibition Secretariat
FAX: +81-3-3292-1813
Inquiries:
Note:
  • Confirmation Letter, Exhibitor Manual and Exhibit Fee Invoice will be sent in the end of January.
  • Please make payment by bank transfer in Japanese Yen no later than March 31, 2005.
  • Smallest available space is one booth unit with the largest being two booth units.
  • Booth location will be decided by the Photomask Japan Organizer.
  • There may be changes to the floor plan depending on the exact number of companies that participate.

[Cancellation Policy]
In principle, cancellations will not be accepted after the participation confirmation notice has been made to contracted exhibitors. If cancellation is unavoidable, the following charges apply:

From application until confirmation letter is sent No charge
After confirmation until February 28, 2005 50% of total participation fee
After March 1, 2005 100% participation fee