Program

The Oral and Poster program (tentative) are available.
Please click below to download PDF file.

PMJ2013 Panel Discussion

Date & Time:
April 18th, 17:10 - 19:10
Theme:
“Future mask patterning technologies in the next decade: searching for the best mix solution”
Panelists:
Inkyun Shin, Samsung Electronics Co., Ltd. (Korea)
Chris Progler, Photronics, Inc. (USA)
Aki Fujimura, D2S, Inc. (USA)
Hans Loeschner, IMS Nano Fabrication AG (Austria)
Hiroshi Matsumoto, NuFlare Technology, Inc. (Japan)
Tor Sandstrom, Micronic Mydata AB (Sweden)
Panel Moderators:
Noriaki Nakayamada, NuFlare Technology, Inc. (Japan)
Ichiro Kagami, Sony Semiconductor Co. (Japan)
(As of April 11, 2013)